Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate
2005-04-05
2005-04-05
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
Multizone chamber
C414S935000, C414S940000, C156S345310
Reexamination Certificate
active
06875282
ABSTRACT:
A substrate transport container is used, for example, in the process of manufacturing integrated circuits of less than 0.13 μm line width, can hold the level of contaminants in the interior of the container for at least particles, acidic gases, basic gases, organic substances and humidity at controlled low levels, and has the size and structure to be compatible with automated semiconductor manufacturing plants. The container is provided with a door for loading and unloading substrates on a surface of a container main body and is constructed so as to hold the substrates inside the container main body at a given distance of separation. Air conditioning apparatuses for reducing the levels of particulate and gaseous contaminants are disposed roughly symmetrically on the container main body.
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Kishi Takashi
Suzuki Yoko
Tanaka Akira
Ebara Corporation
Hassanzadeh Parviz
Moore Karla
Wenderoth , Lind & Ponack, L.L.P.
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