Substrate transfer method and interface apparatus

Details Substrate transfer method and interface apparatus Substrate transfer method and interface apparatus

1996-08-28

1998-08-04

Powell, William

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

156345, 438716, B44C 122, H01L 2100

Patent

active

057888680

ABSTRACT:
An interface apparatus is disposed between a processing unit for performing varied treatments on substrates before and after exposure of the substrates, and an exposure unit for performing the exposure. The interface apparatus includes first and second substrate transfer robots, and a substrate storage having a plurality of storage racks for storing a plurality of substrates. The first substrate transfer robot transfer substrates between the processing unit and substrate storage while the second substrate transfer robot transfers substrates between the substrate storage and exposure unit. Each of the robots is operable independently of and parallel to the other robot. The first transfer robot may be omitted, and when it is so omitted, a substrate transport robot in the processing unit performs the functions of the first transfer robot.

REFERENCES:
patent: 4816116 (1989-03-01), Davis et al.
patent: 5601686 (1997-02-01), Kanamura et al.

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