Substrate transfer and bath apparatus

Details Substrate transfer and bath apparatus Substrate transfer and bath apparatus

1996-06-06

1999-11-02

Graybill, David E.

Metal working

Barrier layer or semiconductor device making

H01L 2168

Patent

active

059761989

ABSTRACT:
The substrate processing apparatus comprises at least one chemical liquid bath for processing the substrate with a chemical liquid, and a multi-function processing bath for performing at least two of chemical liquid processing, cleaning with water and drying on the substrate which is processed with a chemical liquid within the chemical liquid bath.

REFERENCES:
patent: 5590672 (1997-01-01), Ohmori et al.
patent: 5603777 (1997-02-01), Ohashi
patent: 5647914 (1997-07-01), Goto et al.
patent: 5722442 (1998-03-01), Hoffman et al.
patent: 5730162 (1998-03-01), Shindo et al.
patent: 5741367 (1998-04-01), Inada et al.

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