Substrate temperature control apparatus and technique for CVD re

Details Substrate temperature control apparatus and technique for CVD re Substrate temperature control apparatus and technique for CVD re

1993-05-18

1994-06-07

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

427249, 423446, C23C 1600, B01J 306

Patent

active

053188012

ABSTRACT:
One of the critical experimental parameters affecting the quality and gro rate of chemical vapor deposition species, such as, diamond is the substrate temperature. An apparatus and technique for the precise control of the substrate temperature in a chemical vapor deposition environment has been developed. In a preferred embodiment, the technique uses a variable gas mixture in conjunction with the disclosed apparatus of the present invention to precisely control the temperature of the substrate to within at least .+-.20.degree. C. for extended periods of time and over large area substrates on the order of 1" in diameter or larger.

REFERENCES:
patent: 4938940 (1990-07-01), Hirose et al.
patent: 5068871 (1991-11-01), Uchida et al.
patent: 5182093 (1993-01-01), Cann

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