Substrate supporting mechanism and substrate processing...

Details Substrate supporting mechanism and substrate processing... Substrate supporting mechanism and substrate processing...

2011-07-19

2011-07-19

Hassanzadeh, Parviz (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345520, C219S390000, C219S444100, C219S539000, C219S541000, C219S544000, C219S548000

Reexamination Certificate

active

07981218

ABSTRACT:
A substrate supporting mechanism includes a function for heating a substrate placed thereon in a process container of a substrate processing apparatus. The substrate supporting mechanism includes a worktable configured to place the substrate thereon and including a heating element made of silicon carbide and formed in a predetermined pattern; an electric feeder electrode configured to supply electricity to the heating element; and a partition member made of an electrically insulating material and interposed between portions adjacent to each other in the heating element formed in the predetermined pattern.

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patent: 2002/0011478 (2002-01-01), Ratliff et al.
patent: 2008/0223524 (2008-09-01), Kasanami et al.
patent: 7-272834 (1995-10-01), None
patent: 2005-302936 (2005-10-01), None
patent: 2005-0115940 (2005-12-01), None
patent: WO 2004/095560 (2004-11-01), None

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