Substrate-supporting device for semiconductor processing

Details Substrate-supporting device for semiconductor processing Substrate-supporting device for semiconductor processing

1999-07-01

2000-09-05

Utech, Benjamin L.

Coating apparatus

Gas or vapor deposition

Work support

118724, 118725, 156345, C23C 1600

Patent

active

061137049

ABSTRACT:
A supporting structure of a susceptor for semiconductor processing includes: (a) a plate having a carrying surface for placing a semiconductor substrate thereon, which plate has a back surface having a first coupling structure with a first pawl; and (b) a heating block for heating the semiconductor substrate, which heating block has an upper surface in contact with the back surface of the plate. The upper surface has a second coupling structure with a second pawl corresponding to the first coupling structure with the first pawl. A coupler may be used for placing the first pawl and the second pawl in pressure contact to couple the plate and the heating block.

REFERENCES:
patent: 5916370 (1999-06-01), Chang
patent: 6022413 (2000-02-01), Shinozano et al.
patent: 6035101 (2000-03-01), Sajoto et al.

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