Substrate supporting apparatus

Details Substrate supporting apparatus Substrate supporting apparatus

2007-10-02

2007-10-02

Ross, Dana (Department: 3722)

Chucks or sockets

Pivoted jaw

C279S003000, C118S724000, C269S021000

Reexamination Certificate

active

10751478

ABSTRACT:
A substrate supporting apparatus for supporting a substrate or wafer in a non-contact state by Bernoulli theorem is disclosed. The substrate supporting apparatus1comprises a housing2, a rotatable chuck3which is disposed in the housing2, which is provided at its central portion with a hollow12and which supports a substrate6, and a cylindrical nozzle member4which is disposed in the housing2, which has a nozzle hole7and which can vertically move in the hollow12. A nozzle hole7is formed in a central portion of the nozzle member4. Gas is discharged from a gas source8through the nozzle hole7, thereby holding the substrate6by an upper surface of the chuck3in a non-contact state. When the substrate6is to be detached, the nozzle member4is moved upward while discharging gas from the nozzle hole7, thereby floating the substrate6.

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