Substrate support structure, heat treatment apparatus using...

Details Substrate support structure, heat treatment apparatus using... Substrate support structure, heat treatment apparatus using...

2011-04-19

2011-04-19

Wilson, Gregory A (Department: 3749)

Heating

Accessory means for holding, shielding or supporting work...

C432S259000, C219S444100

Reexamination Certificate

active

07927096

ABSTRACT:
A heat treatment apparatus includes a support sheet placed on an upper surface of a heat-treating plate. The support sheet has, formed on an upper surface thereof, projections for contacting and supporting a substrate, and a lip for contacting edge regions of the substrate. The support sheet is formed by an etching process, and therefore areas of the sheet around the projections are recessed, rather than being perforated as in the case of laser processing. These heat-treating plate and support sheet constitute a substrate support structure capable of supporting the substrate properly.

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U.S. Appl. No. 11/566,442, filed Dec. 4, 2006.
Japanese Patent Application No. 2005-353432, filed Dec. 7, 2005, corresponds to U.S. Patent Application listed above.

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