Substrate support structure for ion implantation device

Details Substrate support structure for ion implantation device Substrate support structure for ion implantation device

1987-05-27

1988-12-27

Moore, David K.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

250398, 2504421, 2504941, 2504922, 2504923, 3133591, H01L 21265

Patent

active

047943050

ABSTRACT:
A substrate support structure for an ion implantation device comprises a plurality of substrate holders supporting sample substrates so that each sample substrate can be rotated around an axis perpendicular to its main surface and so that the angle of inclination of said main surface with respect to ion beams can be changed, a rotary drive for rotatively driving the sample substrates, an inclination angle adjuster for changing the angle of inclination of the sample substrate with respect to ion beams, and a rotary disk rotatably installed and supporting the plurality of substrate holders on the same circumference with the center at its rotary axis.

REFERENCES:
patent: 4508056 (1985-04-01), Bruel et al.
Wilson, Robert E. et al., "Ion Beams with Applications to Ion Implantation", A Wiley Interscience Publication, John Wiley & Sons, New York, 1973.

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