Substrate spin treating method and apparatus

Coating apparatus – With indicating – testing – inspecting – or measuring means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118 52, 118319, 134902, 134153, 134157, 396611, 396627, B05C 1100, B08B 300

Patent

active

058534830

ABSTRACT:
A substrate supporting device includes support elements for supporting a substrate, and positioning elements for contacting outer peripheries of the substrate to check horizontal movement thereof. A substrate sensor is disposed around the supporting device for detecting the substrate supported thereon. The supporting device is surrounded also by light projectors for horizontally projecting light having projection tracks overlapping, in a plan view, the substrate supported by the substrate supported device and extending at an angle to one another, and light receivers for receiving the projected light. The substrate sensor and light receivers input signals to a microcomputer for determining whether the substrate is correctly supported. A light projector may project a light beam toward the surface of the substrate supporting on the substrate supporting device, and cause the light beam to be reflected by the substrate surface. Whether the substrate is correctly supported may be determined based on whether the reflected light beam is received by a light receiver. The determination of the substrate being correctly supported is made while the substrate is supported on the supporting device. When the substrate is correctly supported, the substrate supporting device is rotated about a vertical axis to effect a predetermined treatment of the substrate.

REFERENCES:
patent: 5032217 (1991-07-01), Tanaka
patent: 5421056 (1995-06-01), Tateyama et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Substrate spin treating method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate spin treating method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate spin treating method and apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1420073

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.