Substrate rotation type treatment apparatus

Details Substrate rotation type treatment apparatus Substrate rotation type treatment apparatus

2007-12-25

2007-12-25

Tadesse, Yewebdar (Department: 1734)

Coating apparatus

Projection or spray type

With hood or offtake for waste material

C118S052000, C118S320000, C134S153000, C134S198000

Reexamination Certificate

active

11256976

ABSTRACT:
An apparatus causes a substrate to rotate and supplies a treatment liquid to a substrate surface to make a treatment, without concern that a mixed substance is eluted from a cup in the use for a long time, or a thin film comes off from an inside wall surface to be contamination-causing substances even if the cup made of a water-repellent material for collecting a treatment liquid becomes hydrophilic. A cup16disposed to surround the sides and underside of a substrate W rotating while being held by a spin chuck10, and serving to collect a treatment liquid diffused from the substrate to the surroundings, is made of a plastic material. Further, an inside wall surface of an upper-side cup part24of the cup16, being a portion on which the treatment liquid having been diffused from the substrate impinges, is roughened to be a hydrophilic surface.

REFERENCES:
patent: 07116870 (1995-05-01), None
patent: 10-258249 (1998-09-01), None
patent: 2004356299 (2004-12-01), None
English Translated Abstract and Detailed Description of JP-2004-356299.
English Translated Detailed Description of JP10-258249.
English Translated Abstract of JP07-116870.

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