Substrate provided with an alignment mark in a substantially...

Details Substrate provided with an alignment mark in a substantially... Substrate provided with an alignment mark in a substantially...

2005-02-22

2005-02-22

Blum, David S. (Department: 2813)

Active solid-state devices (e.g., transistors, solid-state diode

Alignment marks

Reexamination Certificate

active

06858948

ABSTRACT:
A substrate provided with an alignment mark in a substantially transmissive process layer overlying the substrate, said mark comprising high reflectance areas for reflecting radiation of an alignment beam of radiation, and low reflectance areas for reflecting less radiation of the alignment beam, wherein the low reflectance areas comprise scattering structures for scattering and absorbing radiation of the alignment beam.

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European Search Report for Application No. 01201956.8, dated Dec. 21, 2001.
European Search Report for EP 03077203.2, dated Jun. 24, 2004.

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