Substrate profile analysis

Details Substrate profile analysis Substrate profile analysis

2006-05-02

2006-05-02

Nghiem, Michael (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system

Performance or efficiency evaluation

Reexamination Certificate

active

07039556

ABSTRACT:
A system for analyzing fabrication processes, such as analyzing device yield on a substrate. An input accesses fabrication information, where the fabrication information includes at least one of an dependent variable that is associated with substrate location information, and at least one independent variable that is associated with at least one of the fabrication processes. Desired portions of the substrate information are selected, based on at least one of the independent variable and the dependent variable. A substrate profile is produced, based on the desired portions of the fabrication information.

REFERENCES:
patent: 2003/0229410 (2003-12-01), Smith et al.
patent: 2004/0162692 (2004-08-01), Ye et al.
patent: 2005/0060336 (2005-03-01), Abercrombie et al.
patent: 2005/0132308 (2005-06-01), Whitefield et al.

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