Substrate processing system with positioning device and...

Material or article handling – Loading or unloading a railway car by utilizing the tractor...

Reexamination Certificate

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C414S935000, C198S394000

Reexamination Certificate

active

06857838

ABSTRACT:
A substrate processing system includes a notch aligner. The notch aligner includes a rotating support device, a servomotor for rotating the rotating support device, a sensor for detecting a notch formed in a wafer, a wafer lifting device, a cylinder actuator for vertically moving the wafer lifting device, and a CPU. The rotating support device holds a wafer in a horizontal position. The sensor detects the notch to determine the orientation of the wafer. The wafer lifting device receives the wafer from the rotating support device and lifts up the wafer from the rotating support device. A notch detection signal provided by the sensor is given to the CPU. The CPU gives control signals to the servomotor and the pneumatic cylinder actuator to operate the servomotor and the cylinder actuator so that the wafer is aligned.

REFERENCES:
patent: 4685206 (1987-08-01), Kobayashi et al.
patent: 4770600 (1988-09-01), Ishikawa
patent: 4887904 (1989-12-01), Nakazato et al.
patent: 6309163 (2001-10-01), Nering
patent: 6485248 (2002-11-01), Taylor, Jr.
patent: 6524051 (2003-02-01), Nering
patent: 2000-21956 (2000-01-01), None

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