Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2011-07-12
2011-07-12
Deo, Duy-Vu N (Department: 1713)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C438S745000, C438S747000
Reexamination Certificate
active
07976637
ABSTRACT:
A substrate processing system which enables a minute pieces of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out predetermined processing on a substrate. The substrate processing system comprises a substrate surface processing apparatus having a fluid supply unit that supplies onto a surface of the substrate a fluid containing an altering substance that alters a substance exposed at the surface of the substrate, and a substrate surface inspecting apparatus that inspects the surface of the substrate onto which the fluid has been supplied.
REFERENCES:
patent: 4661369 (1987-04-01), Crane
patent: 4897676 (1990-01-01), Sedberry
patent: 1-219546 (1989-09-01), None
Moriya Tsuyoshi
Nagaike Hiroshi
Deo Duy-Vu N
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
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