Material or article handling – Article reorienting device
Reexamination Certificate
2005-08-12
2008-12-09
Wilczewski, M. (Department: 2822)
Material or article handling
Article reorienting device
C118S729000, C118S500000, C414S940000, C414S757000
Reexamination Certificate
active
07462011
ABSTRACT:
A substrate processing system which is capable of preventing dust from becoming attached to substrates without increasing the degree of cleanliness of a clean room to a predetermined level, and also capable of increasing the substrate processing throughput without increasing the burden on workers. a plasma processing apparatus2that subjects semiconductor wafers W to plasma processing in a cleaned atmosphere. A SMIF4has a enclosure23that is connected to the plasma processing apparatus2and has a cleaned atmosphere therein, a pod stage26on which a pod3housing semiconductor wafers W is mounted, a pod mounting portion24that carries out removal of semiconductor wafers W from the pod3and housing of semiconductor wafers W into the pod3, and a wafer cassette transfer arm27that transfers semiconductor wafers W between the pod stage26and the plasma processing apparatus2via the enclosure23. A preliminary loader5having a stage-shaped unprocessed pod port28that stores a pod3housing semiconductor wafers W that have not been subjected to the plasma processing, a shelf-like processed pod port29that stores a sealed container housing semiconductor wafers W that have been subjected to the plasma processing, and a pod moving mechanism30that moves the pods3between the stage-shaped unprocessed pod port28and the pod stage26, and between the pod stage26and the shelf-like processed pod port29.
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Makino Tsukasa
Yamazaki Satoshi
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
Wilczewski M.
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