Substrate processing system and substrate transfer method

Details Substrate processing system and substrate transfer method Substrate processing system and substrate transfer method

2007-06-15

2011-10-25

Kasenge, Charles (Department: 2121)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S121000, C700S123000

Reexamination Certificate

active

08046095

ABSTRACT:
A substrate processing system (100) includes a main transfer line (20) configured to transfer wafers (W) over the entire system, and an auxiliary transfer line (30) configured to transfer wafers (W) inside a photolithography process section (1a). The photolithography process section (1a) is arranged such that a resist coating process apparatus (2) and a developing process apparatus (5) are disposed separately from each other, a first light exposure process apparatus (3a) and a first PEB process apparatus (4a) are disposed adjacent to each other, and a second light exposure process apparatus (3b) and a second PEB process apparatus (4b) are disposed adjacent to each other.

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