Substrate processing system and substrate processing method

Details Substrate processing system and substrate processing method Substrate processing system and substrate processing method

2005-03-01

2005-03-01

Everhart, Caridad (Department: 2825)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S745000, C438S905000, C134S104400, C134S104100

Reexamination Certificate

active

06861371

ABSTRACT:
The present invention provides a substrate processing system and method which can prevent the filter from being stuffed with foreign objects and make the filter accordingly more durable.The substrate processing system12comprising a substrate processing unit46for processing substrates W with a processing liquid, and a processing liquid recovery passage75for passing the processing liquid discharged from the substrate processing unit46, in which the processing liquid recovery passage75includes a filter80for removing foreign objects mixed in the processing liquid, a cleaning fluid supply passage120for feeding a cleaning fluid for cleaning the filter80, and a discharge passage115for discharging the processing liquid and the cleaning fluid from the filter80.

REFERENCES:
patent: 5059331 (1991-10-01), Goyal
patent: 6074561 (2000-06-01), Jablonsky
patent: 2001-120964 (2001-05-01), None
patent: 2002-075957 (2002-03-01), None

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