Substrate processing method, substrate processing apparatus...

Details Substrate processing method, substrate processing apparatus... Substrate processing method, substrate processing apparatus...

2004-12-07

2010-06-08

Barr, Michael (Department: 1792)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S026000, C134S030000

Reexamination Certificate

active

07731799

ABSTRACT:
A substrate processing method which removes an ArF resist film from a wafer having the ArF resist film. As an ultraviolet irradiation process is performed on the ArF resist film, and then an ozone gas and water vapor are fed to the ArF resist film, the ArF resist film is altered in a water-soluble state. Thereafter, the ArF resist film is removed from the substrate by feeding pure water to the ArF resist film altered into the water-soluble state.

REFERENCES:
patent: 6613692 (2003-09-01), Toshima et al.
patent: 6616773 (2003-09-01), Kuzumoto et al.
patent: 2001/0004898 (2001-06-01), Kamikawa et al.
patent: 2002/0185225 (2002-12-01), Toshima et al.
patent: 2003/0170949 (2003-09-01), Chouno et al.
patent: 2001-223206 (2001-08-01), None
patent: 2002-18379 (2002-01-01), None
patent: 2002-134401 (2002-05-01), None
patent: 2002-184741 (2002-06-01), None
patent: 2002-231696 (2002-08-01), None
patent: 2003-273085 (2003-09-01), None
patent: 2003-332322 (2003-11-01), None

Affiliated with

Also associated with

Rating

Substrate processing method, substrate processing apparatus... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing method, substrate processing apparatus..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing method, substrate processing apparatus... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4161639