Substrate processing method, substrate processing apparatus,...

Details Substrate processing method, substrate processing apparatus,... Substrate processing method, substrate processing apparatus,...

2008-03-20

2009-11-17

Mathews, Alan A (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C700S121000, C118S663000

Reexamination Certificate

active

07618203

ABSTRACT:
In the present invention, when trouble occurs and the operation of a substrate processing apparatus is stopped, substrate information containing positions and processing states of the substrates located in the apparatus at that time is stored, and the power supply of the apparatus is then turned off. When the apparatus is restarted, the substrates located in the apparatus are collected into a substrate housing unit, and each of the substrates in the substrate housing unit is then sequentially transferred to a plurality of processing units following the same transfer recipe as that before occurrence of trouble, and substrate processing is not performed in a processing unit in which processing has already been completed, whereas substrate processing is performed in a processing unit in which processing has not been performed yet, based on the substrate information.

REFERENCES:
patent: 6945258 (2005-09-01), Itou
patent: 7364922 (2008-04-01), Shimizu
patent: 2006/0162660 (2006-07-01), Shimizu
patent: 2009/0016860 (2009-01-01), Kaneko et al.
patent: 3328869 (2002-07-01), None
patent: 2006-203003 (2006-08-01), None
patent: 2006-203145 (2006-08-01), None
English Translation of JP 09-017838 (dated Jan. 17, 1997).

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