Substrate processing method, program, computer-readable...

Details Substrate processing method, program, computer-readable... Substrate processing method, program, computer-readable...

2011-03-08

2011-03-08

Fuller, Rodney E (Department: 2862)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C396S576000

Reexamination Certificate

active

07901149

ABSTRACT:
A substrate on which a resist film has been formed is transferred to an aligner and subjected to exposure processing. The substrate is then subjected to post-exposure baking in a second processing system. The substrate is then transferred again to the aligner and subjected to exposure processing. The substrate for which exposure processing for the second time has been finished is transferred to a first processing system and again subjected to post-exposure baking. The time periods from the ends of the exposure processing to the starts of the post-exposure baking for the first time and the second time are controlled to be equal. In pattern forming processing in which exposure processing is performed a plurality of times between the resist film forming processing and the developing treatment, a pattern with a desired dimension can be finally formed.

REFERENCES:
patent: 2002/0009902 (2002-01-01), Hashiguchi et al.
patent: 2002/0014600 (2002-02-01), Sato et al.
patent: 2003/0003774 (2003-01-01), Hashiguchi et al.
patent: 2004/0101790 (2004-05-01), Cauchi et al.
patent: 2005/0162627 (2005-07-01), Finders et al.
patent: 2006/0160028 (2006-07-01), Lee et al.
patent: 2007/0172234 (2007-07-01), Shigemori et al.
patent: 2007/0212654 (2007-09-01), Larson et al.
patent: 7 147219 (1995-06-01), None
patent: 11 199830 (1999-07-01), None
patent: 2002 21763 (2002-01-01), None
patent: 2002 43214 (2002-02-01), None
patent: 2002 57200 (2002-02-01), None
patent: 2005 223321 (2005-08-01), None
patent: 2006 49757 (2006-02-01), None
patent: 2006 80489 (2006-03-01), None
patent: 2006-016489 (2006-02-01), None

Affiliated with

Also associated with

Rating

Substrate processing method, program, computer-readable... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing method, program, computer-readable..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing method, program, computer-readable... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2694871