Substrate processing method and substrate processing apparatus

Cleaning and liquid contact with solids – Processes – Including forming a solidified or hardened coating for cleaning

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C134S005000, C134S026000, C134S030000, C134S033000, C134S061000, C134S063000, C134S105000, C134S137000, C134S902000

Reexamination Certificate

active

07867337

ABSTRACT:
A substrate having a liquid film formed by pre-processing unit is transported by a substrate transport robot from the pre-processing unit to a freeze processing unit disposed away from the pre-processing unit. In the freeze-processing unit, the liquid film is frozen. This causes the adhesion power of contaminants adhering to the surface of the substrate reduce, and therefore the contaminants is detached from the surface of the substrate. Subsequently, the substrate which was subjected to the freezing process, is transported from the freeze processing unit to a post-processing unit which is disposed away from the pre-processing unit and the freeze processing. In the post-processing unit, a cleaning liquid is supplied to the frozen film on the rotating substrate, thereby easily removing the contaminants adhering to the substrate together with the frozen film.

REFERENCES:
patent: 4817652 (1989-04-01), Liu et al.
patent: 4883775 (1989-11-01), Kobayashi
patent: 4962776 (1990-10-01), Liu et al.
patent: 5857474 (1999-01-01), Sakai et al.
patent: 5975098 (1999-11-01), Yoshitani et al.
patent: 6051101 (2000-04-01), Ohtani et al.
patent: 6783599 (2004-08-01), Gale et al.
patent: 7410545 (2008-08-01), Matsubara
patent: 2007/0221254 (2007-09-01), Izumi et al.
patent: 2007/0235062 (2007-10-01), Fujiwara et al.
patent: 2008/0121251 (2008-05-01), Miya et al.
patent: 2008/0121252 (2008-05-01), Miya
patent: 62-169420 (1987-07-01), None
patent: 64-9624 (1989-01-01), None
patent: 2-10831 (1990-01-01), None
patent: 3-503975 (1991-09-01), None
patent: 3-261142 (1991-11-01), None
patent: 03261142 (1991-11-01), None
patent: 4-134822 (1992-05-01), None
patent: 11-31673 (1999-02-01), None
patent: 11-329922 (1999-11-01), None
patent: 2000-135475 (2000-05-01), None
patent: 3654923 (2005-03-01), None
patent: 1998-079544 (1998-11-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Substrate processing method and substrate processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing method and substrate processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing method and substrate processing apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2647419

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.