Substrate processing method

Details Substrate processing method Substrate processing method

2006-02-21

2006-02-21

Fuqua, Shawntina T. (Department: 3742)

Electric resistance heating devices

Heating devices

Radiant heater

C392S416000, C219S390000, C219S405000, C219S411000, C118S724000, C118S725000, C118S050100

Reexamination Certificate

active

07003219

ABSTRACT:
A substrate processing apparatus includes a reaction chamber for simultaneously processing a plurality of process substrates, a boat for loading the process substrates into the reaction chamber, and a stocker for storing a multiple number of dummy substrates, at least a portion of the dummy substrates being loaded into the reaction chamber together with the process substrates through the use of the boat. A substrate cleaning process is carried out by loading dummy substrates to be cleaned into the reaction chamber through the use of the boat and introducing a cleaning gas into the reaction chamber.

REFERENCES:
patent: 5112641 (1992-05-01), Harada et al.
patent: 5248886 (1993-09-01), Asakawa et al.
patent: 5683513 (1997-11-01), Fujimaki
patent: 5858103 (1999-01-01), Nakajima et al.
patent: 6238488 (2001-05-01), Fujita et al.
patent: 6301802 (2001-10-01), Kato et al.

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