Substrate processing equipment having mass flow controller

Details Substrate processing equipment having mass flow controller Substrate processing equipment having mass flow controller

2006-11-28

2006-11-28

Krishnamurthy, Ramesh (Department: 3753)

Fluid handling

Line condition change responsive valves

Pilot or servo controlled

C137S486000, C137S599070, C137S599140, C137S614210, C118S715000

Reexamination Certificate

active

07140384

ABSTRACT:
A mass flow controller includes a base having a first passage, an inlet portion for introducing fluid into the first passage, an outlet portion for releasing the fluid from the first passage, and a second passage branched from a first upstream portion of the first passage and connected to a second downstream portion of the first passage A mass flow sensor is connected to the first passage between the inlet portion of the base and the first portion of the first passage; A first valve is disposed in-line with the first passage between the first and second portions. The first valve controls the mass flow of the fluid passing through the first passage;. A second valve is disposed in-line with the second passage to opens/close the second passage. A valve controller compares the mass flow measured by the mass flow sensor to a standard flow, and then positions the first valve such that the measured mass flow corresponds to the standard flow.

REFERENCES:
patent: 5421365 (1995-06-01), Matsuo et al.
patent: 6062246 (2000-05-01), Tanaka et al.
patent: 6817381 (2004-11-01), Otsuki et al.
patent: 6903030 (2005-06-01), Ishii et al.
patent: 2003/0124049 (2003-07-01), Krishnan et al.
patent: 6-53103 (1994-02-01), None
patent: 1998-0011819 (1998-04-01), None

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