Substrate processing device

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C219S390000, C392S400000, C134S902000

Reexamination Certificate

active

10519126

ABSTRACT:
A steam generator40′ provided in a substrate processing apparatus includes a tank301having a hollow cylindrical member302formed of a composite of PTFE and PFA and a pair of side wall plates303connected to the opposite ends of the cylindrical member302.The tank301is surrounded by a shell305of an aluminum alloy to prevent deformation of the tank due to internal pressure of the tank. A heater308is attached to the outer surfaces of the plate members307of the shell305.The shell305restrains the tank301and compresses elastic sealing members305to sealingly engage the cylindrical member302and the side wall plate303with each other.

REFERENCES:
patent: 4186032 (1980-01-01), Ham
patent: 4749440 (1988-06-01), Blackwood et al.
patent: 4879041 (1989-11-01), Kurokawa et al.
patent: 5063609 (1991-11-01), Lorimer
patent: 5105556 (1992-04-01), Kurokawa et al.
patent: 5520743 (1996-05-01), Takahashi
patent: 5776296 (1998-07-01), Matthews
patent: 5911837 (1999-06-01), Matthews
patent: 5940985 (1999-08-01), Kamikawa et al.
patent: 6729041 (2004-05-01), Shindo et al.
patent: 6817370 (2004-11-01), Bergman et al.
patent: 7086410 (2006-08-01), Chouno et al.
patent: 59-128733 (1984-08-01), None
patent: 03-137401 (1991-06-01), None
patent: 06-084464 (1994-03-01), None
patent: 09-199472 (1997-07-01), None
patent: 09-251975 (1997-09-01), None
patent: 09-327669 (1997-12-01), None
patent: 10-055991 (1998-02-01), None
patent: 11-067717 (1999-03-01), None
patent: 2000-091288 (2000-03-01), None
patent: 2001-252550 (2001-09-01), None
patent: 2002-110611 (2002-04-01), None
Partial machine translation of JP2000-091288, Cleaning Method of Semiconductor, Mar. 31, 2000 , Hisashi et al.
Partial machine translation of JP2001-252550, Apparatus for Supplying Steam, Sep. 18, 2001, Masahiro et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Substrate processing device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3843534

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.