Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1996-06-20
1999-08-10
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429825, 20429833, 20429809, 20429811, 118715, 118719, 118724, 156345, 417 51, C23C 1434, C23C 1600
Patent
active
059353953
ABSTRACT:
An apparatus for processing a substrate includes at least one closed chamber for containing the substrate in a controlled environment, and a non-evaporable gettering material in the chamber acting as an internal pump serving as the primary pumping means for removing contaminants from the controlled environment. In this way the use of expensive and bulky cryogenic pumps can be avoided or minimized.
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Capacitorr -New High Capacity Non-Evaporable Getter Pump.
Gendron Luc
Ouellet Luc
Tremblay Yves
McDonald Rodney G.
Mitel Corporation
Nguyen Nam
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