Substrate processing apparatus with integrated cleaning unit

Details Substrate processing apparatus with integrated cleaning unit Substrate processing apparatus with integrated cleaning unit

2008-02-14

2011-10-04

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

With developing

C355S030000, C396S611000

Reexamination Certificate

active

08031324

ABSTRACT:
In a substrate processing apparatus, an indexer block, a resist film processing block, a cleaning/drying processing block, a development processing block, and an interface block are provided side by side in this order. An exposure device is arranged adjacent to the interface block. The exposure device subjects a substrate to exposure processing by means of a liquid immersion method. Substrate platforms are provided in close proximity one above the other between the cleaning/drying processing block and the development processing block for receiving and transferring the substrate therebetween. Reversing units that reverse one surface and the other surface of the substrate are respectively stacked above and below the substrate platforms.

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Decision to Grant a Patent, mailed Dec. 15, 2009, 2 page total.

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