Substrate-processing apparatus, substrate-processing method,...

Details Substrate-processing apparatus, substrate-processing method,... Substrate-processing apparatus, substrate-processing method,...

2011-01-04

2011-01-04

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S313000, C430S330000, C355S027000, C355S030000, C396S611000

Reexamination Certificate

active

07862966

ABSTRACT:
A pattern forming system1is configured to execute a series of processes, which includes a first heat process for performing a heat process on a substrate W after a resist liquid coating process, a light exposure process for performing light exposure on a resist film in accordance with a predetermined pattern, a second heat process for promoting a chemical reaction in the resist film after the light exposure, a developing process for developing the resist film after the light exposure, and an etching process for etching an oxide film by use of a resist pattern formed by the developing process as a mask. The system includes a checking apparatus400configured to measure and check a state of a pattern formed after the etching process, and a control section500configured to use a check result to set a condition for the first heat process and/or the second heat process so as to cause the state of the pattern to be uniform on a surface of the substrate W after the etching process.

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