Substrate-processing apparatus, substrate-processing method,...

Details Substrate-processing apparatus, substrate-processing method,... Substrate-processing apparatus, substrate-processing method,...

2011-01-11

2011-01-11

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S313000, C430S330000, C355S027000, C355S030000, C396S611000

Reexamination Certificate

active

07867673

ABSTRACT:
A pattern forming system1includes a checking apparatus400, a storage device502, and a control section500. The checking apparatus400is configured to measure and check a state of a resist pattern formed on a substrate W after a developing process and output a first check result thus obtained, and to measure and check a state of a pattern formed on the substrate after an etching process and output a second check result thus obtained. The storage device502stores a correlation formula obtained from the first check result and the second check result. The control section500is configured to use the correlation formula to obtain a target value of the state of the pattern after the developing process from a target value of the state of the pattern after the etching process, and to use a difference between the target value of the state of the pattern after the developing process and the first check result to set a condition for the first heat process and/or the second heat process.

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