Substrate processing apparatus having an interface section inclu

Details Substrate processing apparatus having an interface section inclu Substrate processing apparatus having an interface section inclu

1997-11-17

2000-10-03

Monin, Jr., Donald L.

Metal working

Barrier layer or semiconductor device making

414935, 414936, B65G 4907

Patent

active

061267031

ABSTRACT:
A processing system includes a plurality of types of internal processing machines that perform various processes on a semiconductor substrate and an interface section that delivers and receives the semiconductor substrate to and from an external exposure machine for performing an exposure process on the substrate subjected to a resist coating process, wherein the interface section includes a transfer unit for taking in the substrate subjected to a specific process from at least one of the internal processing machines and transferring the substrate and a substrate table unit for temporarily holding the substrate to transfer the substrate between the internal processing machine and the external exposure machine via the transfer unit. The substrate table unit has first and second tables that are laid one on top of the other and can move up and down and stop at a specific height, the first table allowing the substrate to be temporarily placed on it in transferring the substrate to the external exposure machine, and the second table allowing the substrate to be temporarily placed on it in receiving the substrate from the external exposure machine. The transfer unit transfers the substrate between the first and second tables and at least one of the processing machines.

REFERENCES:
patent: 4917556 (1990-04-01), Stark et al.
patent: 4923054 (1990-05-01), Ohtani et al.
patent: 5024570 (1991-06-01), Kiriseko et al.
patent: 5061144 (1991-10-01), Akimoto et al.
patent: 5131799 (1992-07-01), Nishi et al.
patent: 5202716 (1993-04-01), Tateyama et al.
patent: 5339128 (1994-08-01), Tateyama et al.
patent: 5664254 (1997-09-01), Ohkura et al.
patent: 5803932 (1998-09-01), Akimoto et al.
patent: 5826129 (1998-10-01), Hasebe et al.

Affiliated with

Also associated with

Rating

Substrate processing apparatus having an interface section inclu does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing apparatus having an interface section inclu, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing apparatus having an interface section inclu will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-190687