Substrate processing apparatus having a substrate transport with

Details Substrate processing apparatus having a substrate transport with Substrate processing apparatus having a substrate transport with

1997-07-11

1999-03-16

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Multizone chamber

118724, 118725, 20429825, 20429826, 20429835, 414935, 414936, 414937, 414939, 134 11, 134 221, 156345, C23C 1600, B65G 4907, H01L 2100, B08B 700

Patent

active

058824138

ABSTRACT:
A substrate processing apparatus having a plurality of substrate processing modules connected to a substrate transport. The substrate transport has a housing and a substrate transport mechanism. The housing forms a substantially closed main transport chamber with doorways into the main transport chamber for the substrate processing modules. The transport mechanism has a substrate holder movably located in the transport chamber. The housing includes a front end extension that is connected to load locks. The front end extension has an aligner, a cooler, and a buffer directly connected to the housing and located in the front end extension in part of the main transport chamber.

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