Substrate processing apparatus and substrate transferring...

Details Substrate processing apparatus and substrate transferring... Substrate processing apparatus and substrate transferring...

2006-01-03

2006-01-03

Mathews, Alan (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C414S222010, C414S935000

Reexamination Certificate

active

06981808

ABSTRACT:
A resist coating/developing system comprises a cassette station, a process station, and an interface station. A second wafer transfer member for transferring the wafer from a high precision temperature control unit mounted to the interface station to an in-stage of a light exposure device provisionally disposes the wafer held by the second wafer transfer member on a restoration unit in the case where the wafer was taken out from the high precision temperature control unit because it was possible to transfer the wafer onto the in-stage, but it was rendered impossible later to transfer the wafer W onto the in-stage.

REFERENCES:
patent: 5024570 (1991-06-01), Kiriseko et al.
patent: 6126338 (2000-10-01), Akimoto
patent: 6126703 (2000-10-01), Akimoto et al.
patent: 6264705 (2001-07-01), Akimoto et al.
patent: 6281962 (2001-08-01), Ogata et al.
patent: 6293713 (2001-09-01), Ueda

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