Substrate processing apparatus and substrate processing method

Details Substrate processing apparatus and substrate processing method Substrate processing apparatus and substrate processing method

2007-11-13

2011-11-15

Gravini, Stephen M. (Department: 3744)

Drying and gas or vapor contact with solids

Process

Gas or vapor pressure is superatmospheric

C034S218000, C034S381000, C034S078000

Reexamination Certificate

active

08056257

ABSTRACT:
A substrate processing apparatus includes a chamber, and a cleaning-liquid supply unit that supplies a cleaning liquid containing hydrofluoro ether onto a substrate to be processed placed in the chamber. In the chamber, there is further disposed a gas supply unit that supplies into the chamber a gas for preventing moisture from being adhered to a substrate to be processed, when a cleaning liquid containing hydrofluoro ether is supplied onto the substrate to be processed.

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