Semiconductor device manufacturing: process – Miscellaneous
Reexamination Certificate
2006-10-06
2010-10-05
Geyer, Scott B (Department: 2812)
Semiconductor device manufacturing: process
Miscellaneous
Reexamination Certificate
active
07807587
ABSTRACT:
The present invention is a substrate processing apparatus including: a holder that holds substrates in a tier-like manner; a processing container that contains the holder and that conducts a predetermined thermal process to the substrates in a process-gas atmosphere under a predetermined temperature and pressure; a gas-introducing part that introduces a process gas into the processing container; a gas-discharging part that discharges a gas from the processing container to create a predetermined vacuum pressure therein; and a heating part that heats the processing container; wherein the holder is provided with baffle plates each of which forms a processing space for each substrate when the holder is contained in the processing container; the gas-introducing part is provided with gas introduction holes disposed at one lateral side of the respective processing spaces; and the gas-discharging part is provided with gas discharge holes disposed at the other lateral side of the respective processing spaces, oppositely to the gas introduction holes.
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Matsuura Hiroyuki
Nakao Ken
Geyer Scott B
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
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