Substrate processing apparatus and substrate processing method

Details Substrate processing apparatus and substrate processing method Substrate processing apparatus and substrate processing method

2007-03-21

2010-11-30

Koval, Melissa J (Department: 2862)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C396S617000, C396S626000

Reexamination Certificate

active

07841788

ABSTRACT:
In a substrate processing apparatus of the present invention, a buffer bath is provided at any point in a supplying passage of a processing solution supplying part, and a micro bubble generator is provided in the buffer bath. When a substrate is processed, large quantities of micro bubbles can be generated and stored in the buffer bath, and the micro bubbles can be supplied from the buffer bath to a processing bath. This enables the large quantities of micro bubbles to be supplied to the surrounding of the substrate, while the use of the small micro bubble generator avoids an increase in the size of the substrate processing apparatus.

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Chinese Official Action dated Jul. 4, 2008 and English translation thereof.

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