Substrate processing apparatus and substrate processing method

Coating apparatus – Immersion or work-confined pool type – With means for moving work through – into or out of pool

Reexamination Certificate

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Details

C118S733000

Reexamination Certificate

active

07615118

ABSTRACT:
In a substrate processing apparatus of the present invention, when substrates are loaded into a chamber, a frame part formed integral with a substrate holding part is interposed between the chamber and a cover, thereby sealing the interior of the chamber. When the substrates are unloaded to above the chamber, the chamber and the cover are brought into a direct contact, thereby sealing the interior of the chamber. Hence, the interior of the chamber can be sealed satisfactorily when the substrates are loaded into the chamber, and when the substrates are unloaded to above the chamber.

REFERENCES:
patent: 6158449 (2000-12-01), Kamikawa
patent: 6164297 (2000-12-01), Kamikawa
patent: 11-186212 (1999-07-01), None
patent: 11-192459 (1999-07-01), None
patent: 3156075 (2001-02-01), None

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