Substrate processing apparatus and substrate processing method

Coating apparatus – Immersion or work-confined pool type – With means for moving work through – into or out of pool

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C118S429000

Reexamination Certificate

active

10458184

ABSTRACT:
The present invention relates to a substrate processing apparatus and a substrate processing method suitable for processing a substrate with a plurality of liquids. A substrate processing apparatus comprises a substrate holding device for holding a substrate, a container having an opening portion disposed so that the opening portion is opposed to a surface, to be processed, of the substrate, a driving device for moving the container or the substrate holding device between a position at which the container approaches the substrate or a position at which the substrate enters the container, and a position at which the container is positioned away from the substrate, a first treatment liquid supply device for bringing the surface, to be processed, of the substrate which has approached or entered the container into a first treatment liquid, a covering member for covering the opening portion of the container at the position at which the container is positioned away from the substrate, and a second treatment liquid supply device for bringing the surface, to be processed, of the substrate into a second treatment liquid in a state in which the opening portion of the container is covered with the covering member.

REFERENCES:
patent: 4053383 (1977-10-01), Dötzer et al.
patent: 4066515 (1978-01-01), Stoger et al.
patent: 5930549 (1999-07-01), Kim et al.
patent: 6352623 (2002-03-01), Volodarsky et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Substrate processing apparatus and substrate processing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing apparatus and substrate processing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing apparatus and substrate processing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3851249

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.