Substrate processing apparatus and substrate processing method

Details Substrate processing apparatus and substrate processing method Substrate processing apparatus and substrate processing method

2007-11-06

2007-11-06

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C118S052000

Reexamination Certificate

active

11601761

ABSTRACT:
A substrate processing apparatus has at least one of a developing processing apparatus that supplies a developing solution as a processing solution to a non-processed substrate to process and a resist coating processing apparatus that supplies a resist solution as a processing solution to the non-processed substrate. A transfer mechanism enables the non-processed substrate to be transferred to the developing processing apparatus and/or the resist coating processing apparatus. In a substrate processing method processes, an exposed resist is developed on a processing surface of the non-processed substrate inside a cup mechanism of the developing processing apparatus, and a resist solution is supplied to the processing surface of the non-processed substrate inside a cup mechanism of a resist coating processing apparatus. the non-processed substrate is transferred to the developing processing apparatus or the resist coating processing apparatus.

REFERENCES:
patent: 6419408 (2002-07-01), Inada
patent: 6533864 (2003-03-01), Matsuyama et al.
patent: 6715943 (2004-04-01), Nagamine
patent: 11087225 (1999-03-01), None
patent: 2001-118790 (2001-04-01), None
patent: 2002-151376 (2002-05-01), None

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