Substrate processing apparatus and substrate processing method

Details Substrate processing apparatus and substrate processing method Substrate processing apparatus and substrate processing method

2006-08-08

2006-08-08

Krishnamurthy, Ramesh (Department: 3753)

Fluid handling

Processes

Involving pressure control

C137S487500, C137S613000, C118S715000, C438S935000, C134S902000

Reexamination Certificate

active

07086410

ABSTRACT:
A common solvent vapor supply source41and a common processing gas supply source42supply ozone gas and steam to a plurality of processing vessels30A,30B. Pressures in the processing vessels are regulated by adjusting the openings of the valuable throttle valves50A,50B, which are placed in exhaust lines80A,80B, respectively.

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