Substrate processing apparatus and substrate processing method

Details Substrate processing apparatus and substrate processing method Substrate processing apparatus and substrate processing method

2006-08-08

2006-08-08

Edwards, Laura (Department: 1734)

Coating apparatus

Immersion or work-confined pool type

With tank structure, liquid supply, control, and/or...

C204S275100, C134S095100, C134S200000, C134S902000, C134S104100, C134S199000

Reexamination Certificate

active

07087117

ABSTRACT:
The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.

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patent: 11-350148 (1999-12-01), None
patent: 2003/105200 (2003-12-01), None

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