Substrate processing apparatus and substrate processing method

Details Substrate processing apparatus and substrate processing method Substrate processing apparatus and substrate processing method

2006-05-23

2006-05-23

Paschall, Mark (Department: 3742)

Electric heating

Heating devices

With power supply and voltage or current regulation or...

C219S497000, C392S418000, C118S724000

Reexamination Certificate

active

07049553

ABSTRACT:
Immediately after a cold substrate G is placed on a substrate table3, a large electric power P1is supplied to a heating element32embedded in the substrate table for a time period T1so that temperature of the substrate table overshoots a target temperature, and thereafter zero or very small electric power P2is supplied to the heating element for a time period T2so that the temperature of the substrate table3is lowered to the target temperature while temperature of the substrate continues to rise up to the target temperature. When both the temperature of the substrate table and of the substrate reaches approximately to the target temperature after the time period T2has elapsed, control of the electric power is entrusted to a PID controller.

REFERENCES:
patent: 5225663 (1993-07-01), Matsumura et al.
patent: 5567267 (1996-10-01), Kazama et al.
patent: 6222161 (2001-04-01), Shirakawa et al.
patent: 6402509 (2002-06-01), Ookura et al.
patent: 11-74187 (1999-03-01), None

Affiliated with

Also associated with

Rating

Substrate processing apparatus and substrate processing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing apparatus and substrate processing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing apparatus and substrate processing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3540466