Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Reexamination Certificate
2005-02-08
2005-02-08
Mathews, Alan (Department: 2851)
Photography
Fluid-treating apparatus
Fluid application to one side only of photographic medium
C414S935000, C118S052000
Reexamination Certificate
active
06851872
ABSTRACT:
Transferring apparatus control means movement of a transferring apparatus for transferring a wafer to a resist liquid coating unit from a cooling process unit. A storage section of the transferring apparatus controller stores a coating time required for a resist film coating and a moving time required for the transfer of the wafer. When a coating start time of a resist film is inputted, the control section calculates a coating end time from the stored coating time. Further, the control section calculates time of taking out a wafer W, which is next subjected to a coating process from the cooling process unit, from the coating end time and the stored moving time. Based on the calculated time, the transferring apparatus controller instructs the transferring apparatus about timing to take out the wafer. This makes it possible to improve the throughput.
REFERENCES:
patent: 4985722 (1991-01-01), Ushijima et al.
patent: 5015177 (1991-05-01), Iwata
patent: 5826129 (1998-10-01), Hasebe et al.
patent: 6275744 (2001-08-01), Yoshida
Kanbayashi Akira
Okubo Kenichi
Mathews Alan
Rader & Fishman & Grauer, PLLC
Tokyo Electron Limited
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