Substrate processing apparatus and substrate processing method

Details Substrate processing apparatus and substrate processing method Substrate processing apparatus and substrate processing method

2005-04-05

2005-04-05

Mills, Gregory (Department: 1763)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C118S729000, C156S345310, C156S345540, C204S298230

Reexamination Certificate

active

06875280

ABSTRACT:
A substrate processing apparatus includes a chamber, a gas introducing portion, a gas discharge port, a substrate transfer gate, and a substrate moving member which moves the substrate between a substrate processing position where the substrate is processed in the chamber and a substrate transferring in-out position in the chamber where the substrate transferred into the chamber from the substrate transfer gate is located and where the substrate is located when the substrate is transferred out from the chamber through the substrate transfer gate. The gas introducing portion, the substrate processing position, the gas discharge port and the substrate transfer gate are disposed in this order. A gas restraining member which restrains processing gas for processing the substrate from flowing toward the substrate transfer gate is provided between the gas discharge port and the substrate transfer gate.

REFERENCES:
patent: 5177878 (1993-01-01), Visser
patent: 5352294 (1994-10-01), White et al.
patent: 5520743 (1996-05-01), Takahashi
patent: 5558717 (1996-09-01), Zhao et al.
patent: 5653808 (1997-08-01), MacLeish et al.
patent: 5968379 (1999-10-01), Zhao et al.
patent: 6113984 (2000-09-01), MacLeish et al.
patent: 6176929 (2001-01-01), Fukunaga et al.
patent: 06-020957 (1994-01-01), None
patent: 06-135795 (1994-05-01), None
patent: 08-325736 (1996-12-01), None
patent: 10-055968 (1998-02-01), None
patent: 10-298767 (1998-11-01), None

Affiliated with

Also associated with

Rating

Substrate processing apparatus and substrate processing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing apparatus and substrate processing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing apparatus and substrate processing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3411634