Substrate processing apparatus and slit nozzle

Details Substrate processing apparatus and slit nozzle Substrate processing apparatus and slit nozzle

2005-06-28

2005-06-28

Fiorilla, Chris (Department: 1734)

Coating apparatus

Projection or spray type

Moving projector

C118S429000, C427S600000, C427S421100, C239S076000

Reexamination Certificate

active

06911088

ABSTRACT:
A slit nozzle includes a solution feeding mechanism having an elastic element and a plurality of piezoelectric devices and embedded in a side surface of a flow passage near a slit in the slit nozzle. Control is effected so that the piezoelectric devices are vibrated to cause the elastic element to produce traveling waves toward the slit. A resist solution serving as a processing solution is pumped by the traveling waves, thereby to be discharged through the slit toward a substrate. This provides a substrate processing apparatus capable of smoothly discharging the processing solution to accomplish high discharge accuracy.

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patent: 9-164357 (1997-06-01), None
patent: 2001-310152 (2001-11-01), None

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