Substrate processing apparatus and semiconductor device...

Details Substrate processing apparatus and semiconductor device... Substrate processing apparatus and semiconductor device...

2004-08-05

2009-11-24

Kackar, Ram N. (Department: 1792)

Coating apparatus

Gas or vapor deposition

With treating means

C118S715000, C156S345510, C156S345520

Reexamination Certificate

active

07622007

ABSTRACT:
Disclosed is a substrate processing apparatus which comprises reaction tubes (3,4) for processing multiple substrates (27), a heater (5) for heating the substrates, and gas introducing nozzles (6,7,8,9,10) for supplying a gas into the reaction tubes. Each of the gas introducing nozzles (6,7,8,9) is structured so that at least the channel cross section of a portion facing the heater (5) is larger than those of the other portions.

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