Liquid purification or separation – With means to add treating material – Directly applied to separator
Reexamination Certificate
2011-07-19
2011-07-19
Lithgow, Thomas M (Department: 1776)
Liquid purification or separation
With means to add treating material
Directly applied to separator
C210S167010, C210S167310, C210S196000, C216S096000, C134S111000, C134S902000, C156S345180
Reexamination Certificate
active
07981286
ABSTRACT:
A liquid within a processing tank is caused to overflow, and the overflowing liquid is circulated by a circulation system. In this process, bubbles are discharged into the liquid within the processing tank. Thus, particles within the processing tank are not only carried along by a flow of the liquid but also attach to the bubbles to be carried with the bubbles outwardly of the processing tank. A dip-type substrate processing apparatus removes the particles within the processing tank in a short time with efficiency.
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Office Action issued by the Japanese Patent Office on Nov. 4, 2009 in connection with corresponding Japanese application No. 2004-331543.
English translation of Office Action issued by Japanese Patent Office on Nov. 4, 2009 in connection with Japanese application No. 2004-331543.
Japanese Office Action dated May 26, 2009 in corresponding Japanese Patent Application No. 2004-331543 (with English language translation).
Japanese Office Action dated May 26, 2009 in corresponding Japanese Patent Application No. 2004-268006 (with English language translation).
Japanese Office Action dated May 26, 2009 in corresponding Japanese Patent Application No. 2004-283465 (with English language translation).
Office Action issued by the Japanese Patent Office on Sep. 15, 2009 in connection with corresponding Japanese application No. 2004-283465.
English translation of Office Action issued by Japanese Patent Office on Sep. 15, 2009 in connection with Japanese application No. 2004-283465.
Arai Kenichiro
Higuchi Ayumi
Dainippon Screen Mfg Co. Ltd.
Lithgow Thomas M
Ostrolenk Faber LLP
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