Cleaning and liquid contact with solids – Apparatus – Automatic controls
Reexamination Certificate
2005-09-20
2005-09-20
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
Automatic controls
C134S0570DL, C134S061000, C134S062000, C134S066000, C134S113000, C134S902000, C118S668000, C414S222010, C414S222020, C414S222030, C414S222070
Reexamination Certificate
active
06945258
ABSTRACT:
A cleaning processing system including a wafer transfer device, a wafer detecting sensor for detecting a wafer, a memory for storing the position and direction of an extra wafer present inside the cleaning processing system when the power supply is cut off, an alarm device for generating an alarm in the case where the information detected by the wafer detecting sensor when the power supply to the cleaning processing system is turned on differs from the wafer information taken out of the memory, an alarm canceling section for canceling the alarm, an apparatus control section for controlling the wafer transfer device to recover the extra wafer, and a recovery start-up section for emitting an instruction to start the wafer recovery to the apparatus control section.
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patent: 9-17838 (1997-01-01), None
H.Hansen et al. Transport mechanism for auto control of sequential dipping operation. IBM Technical Disclosure Bulletin. vol. 23, No. 7A, Dec. 1980.
Kornakov M.
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
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