Substrate processing apparatus and method

Details Substrate processing apparatus and method Substrate processing apparatus and method

2008-07-01

2008-07-01

Perrin, Joseph L (Department: 1792)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S184000, C134S186000

Reexamination Certificate

active

07392814

ABSTRACT:
Pure water dissolving nitrogen gas and containing microbubbles is supplied to a substrate. Since microbubbles are very minute in size and also have the electrostatic property, they can efficiently adsorb particles on the substrate surface or in the pure water. Further, since pure water dissolving nitrogen gas is unlikely to be charged, the pure water itself never carries new particles from each component of the apparatus. These functions allow efficient particle removal from the substrate surface or the liquid.

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