Substrate processing apparatus and method

Details Substrate processing apparatus and method Substrate processing apparatus and method

2006-11-28

2006-11-28

Cameron, Erma (Department: 1762)

Coating processes

Immersion or partial immersion

C205S224000, C205S209000, C204S22400M, C427S434300, C118S059000, C118S666000

Reexamination Certificate

active

07141274

ABSTRACT:
A substrate processing apparatus and method which employs the so-called batch processing method of processing a plurality of substrates simultaneously, thereby increasing the throughput, and which can carry out processing, such as electroless plating, stably and securely with a relatively simple apparatus. The substrate processing apparatus includes: a processing bath (14) for holding a processing liquid (12); and a substrate holder (16) which is vertically movable relative to the processing bath (14) and which includes a plurality of substrate holding portions (40) for holding a plurality of substrates (W) in parallel. Each substrate holding portion (40) has a substrate stage (48) and a substrate presser (54), which can move close to or away from each other and can grip therebetween a peripheral portion of a substrate to thereby hold the substrate with its back surface sealed, and has a heating medium flow passage (62) for passing a heating medium therethrough so as to regulate the temperature of the substrate holding portion (40).

REFERENCES:
patent: 6042712 (2000-03-01), Mathieu
patent: 4-32572 (1992-02-01), None
patent: 9-246215 (1997-09-01), None
patent: 11-80968 (1999-03-01), None

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