Substrate processing apparatus and method

Details Substrate processing apparatus and method Substrate processing apparatus and method

1995-04-06

1997-09-16

Teska, Kevin J.

Boots, shoes, and leggings

36446801, 414222, 414273, G06F 1900

Patent

active

056687338

ABSTRACT:
Substrates of a precedent lot are transported among first processing parts while being processed by the first processing parts. The circulating transportation for the precedent lot is interrupted after starting of the circulating transportation of the first substrate of the precedent lot before starting of the circulating transportation of the last substrate of the precedent lot. Thereafter, a substrate of a subsequent lot is transported among second processing parts while being processed by the second processing parts. Hence, processing of the substrates of the precedent and subsequent lots are concurrently processed, resulting in improving a through put.

REFERENCES:
patent: 4278366 (1981-07-01), Loveless et al.
patent: 4825808 (1989-05-01), Takahashi et al.
patent: 4909695 (1990-03-01), Hurwitt et al.
patent: 5067218 (1991-11-01), Williams
patent: 5100276 (1992-03-01), Iwasaki et al.
patent: 5164034 (1992-11-01), Arai et al.
patent: 5164905 (1992-11-01), Iwasaki et al.
patent: 5308210 (1994-05-01), Ohtani et al.
patent: 5436848 (1995-07-01), Nishida et al.
patent: 5442416 (1995-08-01), Tateyama et al.
patent: 5536128 (1996-07-01), Shimoyashiro et al.

Affiliated with

Also associated with

Rating

Substrate processing apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-222876